The precise creation of nanoscale structures is a fundamental requirement of research in nanotechnology. Most current nanolithography techniques can be grouped into three general approaches � optical-, electrical-, and mechanical-based nanofabrication. Surface probe microscopy, atomic force microscopy (AFM) in particular, offers the high resolution and control necessary for nanolithography applications by using electrical and mechanical approaches to create nanopatterns of material. While there have been many advances in one of the earliest AFM techniques, dip-pen nanolithography, other nanofabrication methods such as nanografting and tip-induced anodic-oxidation have proven to be useful for depositing a wide range of materials onto diverse surfaces in a controlled manner. We will present different strategies and examples of AFM-based nanofabrication that demonstrate the importance of various factors (such as controlled atmosphere, humidity, applied tip force, and write speed) and their limitations.